Carlos will be offering training on the use of the SU8 Laurell Spinner in the BiON Hot Embossing Room. The trainings will be individual for 15 mins each and will take place next Tuesday between 1 – 2:30. Please contact Alana (anvalenc@uci.edu) to schedule.
Integrated Nanosystems Research Facility
The SEM is back up.
We experienced a small power outage this morning so the STS & SEM will be down until Jake can take a look at them. I should have an update this afternoon.
The card readers on the wet process doors should be fully operational by Friday afternoon. In order to have access we should have your signed Chemical Usage form and your signed Equipment Training Log. Only qualified users will be allowed entry in those areas (including buddies). All users must scan their card for entry. Please do not let users in the room if they do not have their access card. Failure to comply with the rules may result in possible loss of room or lab privileges.
This week Lifeng will be hosting two demo sessions on chemical wet process.
He will cover:
- Proper operation of the laminar flow hood
- Wast management of reactive chemicals
- Labeling
The Demo’s are scheduled this Wednesday and Thursday from 1:00 – 2:30pm. Each Demo will allow for 6 users. If interested please RSVP to Ryan Smith at sryan@uci.edu.
This week we have two sessions scheduled for wet bench qualification:
Wednesday 11:30 – 1:00PM
Thursday 3:00PM – 4:30PM
If interested, please e-mail Alana Valencia at anvalenc@uci.edu to schedule. We will have a total of 12 time slots available and will be scheduling on a first come first serve basis.
The proxy readers have been installed in the BION wet process rooms however they are still not fully functional. We are waiting to hear from Facilities on when they will be up. In the meantime the doors are locked but staff can let you in if you give them some notice. We will try and have a status update for you later today.
Today proxy readers will be installed in the following BiON wet etch rooms:
1432 HF/BOE etch area
1422 metal etch & solvent clean area
1421 Inorganic cleaning area for RCA1 & RCA2 & Piranha & KOH
There will be no access to the wet process rooms while they are working. Once installed, only those users that have been qualified (training log must be signed) and that have completed the chemical usage form will be authorized to access. Let us know if you have any questions.
The chemical usage form can be downloaded from:
https://www.inrf.uci.edu/wordpress/wp-content/uploads/chemical-usage-form.pdf
Next weeks weather will be bringing hot and dry conditions again and with that the labs will experience some dry conditions as well. We can control the humidity, to some extent, in the INRF but the BION is out of our hands until they upgrade the humidifiers. If you are working on lithography please look up the manufactures recommended conditions for any of the chemicals you plan to use to ensure your projects are successful.
Due to limited staff next week the Wet Process rooms will be available upon request only.