Integrated Nanosystems Research Facility
Wet & Dry SOPs
- Alcohol Hydroxide Cleaner
- Anisotropic Si Etch using KOH
- AZ4620 Resist (50um)
- AZ4620 Resist (12um)
- Basic Chemical Handling
- Buffered Oxide Etch
- Cleaning Pro for Glass Substrates
- Depositing Nickel Electroless Plating
- Glass Etch Wet Process
- Gold Etch using potassium
- HF (2%) DIP
- HF Wet Bench (BiON)
- Iron Oxide Masks
- Isotropic Si Etch using HNA
- Lift off
- Nickel Etch
- Silicon RCA-1
- Silicon RCA-2
- Silicon Solvent Clean