Integrated Nanosystems Research Facility

Jake, Lifeng and Vu will be out today. Mo should be in around 12.

Note: Due to a staff shortage, all cleanroom/foundry appointments should be scheduled with staff via email.

Thanks,
INRF Staff

Jake will be out today (6/21/13) and Monday. There will be no wet processing in the BION for both of those days. Sorry for any inconvenience.

Thanks,
INRF Staff

Today the School of Engineering is hosting the Staff Recognition luncheon at The University Club at 11:30AM to honor staff members. Therefore the INRF Office will be closed today during the lunch hour between 11:30AM to 1:00PM.

On Friday around 5pm we experienced very high airflow in in the lab. Facilities is currently working on the air handler on the roof to fix the issue. We at this time do not know when it will be fixed. The benches in the INRF have been tagged out until the work is complete and we feel it is safe.

Thanks,
INRF Staff

We have moved all the wet etch processes from INRF to BiON and they are open to use. You must see staff and be approved to use the benches before you can use them.
– The HF process is set up in 1432.
– The organic cleaning process which is RCA1, RCA2 and Pirana is in 1421.
– The metal etch is done in 1422.

Wet process is the INRF is still on hold along with the lithography. We will let you know when this is resolved.

Thanks,
INRF Staff

Dear INRF/ BiON Users:

Currently all the Su8 and lithography are available in the BiON Cleanroom.

Tentatively we are planning to move all the wet etch processes from INRF to BiON.
– The HF process will be set up in 1432.
– The organic cleaning process which is RCA1, RCA2 and Pirana will be in 1421.
– The metal etch will be done in 1422.

In the INRF Cleanroom, we are preparing to make available all the electroplating, lithography and developing processes.

We are hoping to have this accomplished by Monday, June 10th.

Please continue to check the blog for any changes.

INRF Staff

The INRF ventilation system was inspected by contractors on 5/24/13 and we are hopeful that a temporary solution will be possible so the benches will be operational again soon. We anticipate receiving their recommendation for the temporary fix sometime during the last week of June. However, the lithography area in the INRF may be opened for use sometime next week. The acid areas for wet processing will remain closed until the temporary fix is in place, which is now estimated to be completed sometime in July.

The BiON Ventilation modification and installation of HF monitors is scheduled to be complete this week, so we anticipate opening the benches for use on Monday of next week. We will be designating areas within the BiON for wet processing, so that work previously completed in the INRF can now be transferred to the BiON.

We appreciate your patience during this time.

INRF Staff

Due to meetings all day Jake has cancelled today’s 1:30 user meeting. The meeting will take place next week at the usual time.

Thanks,
INRF Staff