Integrated Nanosystems Research Facility

We have moved all the wet etch processes from INRF to BiON and they are open to use. You must see staff and be approved to use the benches before you can use them.
– The HF process is set up in 1432.
– The organic cleaning process which is RCA1, RCA2 and Pirana is in 1421.
– The metal etch is done in 1422.

Wet process is the INRF is still on hold along with the lithography. We will let you know when this is resolved.

INRF Staff