The INRF ventilation system was inspected by contractors on 5/24/13 and we are hopeful that a temporary solution will be possible so the benches will be operational again soon. We anticipate receiving their recommendation for the temporary fix sometime during the last week of June. However, the lithography area in the INRF may be opened for use sometime next week. The acid areas for wet processing will remain closed until the temporary fix is in place, which is now estimated to be completed sometime in July.
The BiON Ventilation modification and installation of HF monitors is scheduled to be complete this week, so we anticipate opening the benches for use on Monday of next week. We will be designating areas within the BiON for wet processing, so that work previously completed in the INRF can now be transferred to the BiON.
We appreciate your patience during this time.