Integrated Nanosystems Research Facility

Two new training videos on the STS System DRIE have been posted to the INRF website. You can view the videos by visiting the videos page at:

https://www.inrf.uci.edu/facility/videos/

You can also view the videos directly on YouTube:

STS System DRIE – Standard Operating Procedures
http://youtu.be/kj_UYQ3HAoo

STS System DRIE – Loading Substrate into the Etch Chamber
http://youtu.be/onEpizpBAkI

INRF Staff

A new training video on the HMDS Oven has been posted to the INRF website. It can be viewed on our videos page at:

https://www.inrf.uci.edu/facility/videos/

You can also view it directly on YouTube at:

http://youtu.be/2V3WUij3RF8

INRF Staff

We have new training videos posted on the INRF website. The videos go through standard safety and operating procedures of the INRF and BiON tools. The videos can be found by visiting the INRF homepage at:

https://www.inrf.uci.edu

and clicking on Video Tutorials & Demos link under the Current Users heading.

Or by visiting the page directly at: https://www.inrf.uci.edu/facility/videos/

More videos will be added soon.

INRF Staff

STS is back up!

AB&M UV Flood Exposure System is up. Please check the log book to see the power intensity.

We received the Flow Switch for the Trion and now it just needs to be installed. We will update you when the equipment is up.

The lamp has arrived and we will be installing it today.

UP:

• Ebeam1
• Plasmatherm RIE & PECVD
• STS
• All Furnaces
• All of Lithography
• All Metalization

Note: These have not been benchmarked since the power outage so your results may vary.

DOWN:

• AB&M UV Flood Exposure System Update (Lamp will be here 2/13/14)
• Trion (Flow switch ordered and should be here early next week)

The Gaertner Ellipsometer is back online! Please contact Enric for training.

Thanks,
INRF/BION Staff

Notes from our Super User:

If you are going to use a recipe that is not standard (so none of the following: O2 Clean, Process A or Process B) they should be aware to change the APC to maintain the usual operating pressure and change the platen etch (the new software multiplies by 10 the saved recipe)

Please check with staff before operating the equipment if the above statement does not make sense to you.

Thanks,
INRF/BION Staff