Integrated Nanosystems Research Facility

Notes from our Super User:

If you are going to use a recipe that is not standard (so none of the following: O2 Clean, Process A or Process B) they should be aware to change the APC to maintain the usual operating pressure and change the platen etch (the new software multiplies by 10 the saved recipe)

Please check with staff before operating the equipment if the above statement does not make sense to you.