Microfluidic Biochip

This is a scanning electron microscope (SEM) image of a microfluidic biochip on a fused silica substrate. The image shows the nickel hard mask used during dry etching.

Equipment used:

• E-beam 1 evaporator to deposit a seed layer on the fused silica substrate.
• Laurell Spinner to spin photoresist.
• KS MA6 Mask Aligner to UV expose and pattern the fused silica substrate.
• Electroplating station to plate the nickel hard mask.
• SPTS Glass Etcher to dry etch the microfluidic channels.
• Dektak XT or Dektak 3 profilometers to measure channel’s etch depth.
• Optical microscope to inspect the completed biochip.

This is an optical microscope image of a microfluidic biochip on a fused silica substrate. The image shows the nickel hard mask used during dry etching.

Equipment used:

• E-beam 1 evaporator to deposit a seed layer on the fused silica substrate.
• Laurell Spinner to spin photoresist.
• KS MA6 Mask Aligner to UV expose and pattern the fused silica substrate.
• Electroplating station to plate the nickel hard mask.
• SPTS Glass Etcher to dry etch the microfluidic channels.
• Dektak XT or Dektak 3 profilometers to measure channel’s etch depth.
• Optical microscope to inspect the completed biochip.