SPTS , STS and Trion Users,
1- Please remember that users of the SPTS, STS, and Trion may NOT change any other recipe parameters other than TIME. Do NOT enable/disable other equipment set-points either like He Leak Up Rate interlocks or any pre-set values.
If you wish to modify parameters other than just the TIME you MUST receive explicit permission from staff in advance.
2- Staff is also finding that <30min post-process cleaning times are insufficient. So instead of having half the etch time as the clean time as a rule. The new rule is as follows:
Users must run the post-process run chamber plasma cleaning for half of the processed etch time or for a minimum of 30 minutes. That is, any etch processes <60min require a 30min or longer plasma clean, and any etch processes >60min must have a clean time of half of the etch time.
Examples:
10min etch = 30min clean
20min etch = 30min clean
50min etch = 30min clean
80min etch =40min clean
90min etch =45min clean
3- For the SPTS, users MUST run their clean recipes that are “with wafer”.
*Reminder: Staff also recommends a clean prior to your process run to help ensure process repeatability
-Staff
STS Users,
The INRF’s STS load lock gate valve is in need of a PM. The PM is expected to take 2 days, so to best accommodate users please send your scheduled reservations of the tool to Richard at rschang@uci.edu so that we can schedule the PM to minimize user impact.
Thank You,
Staff
Please see the reminder below for this event. Please RSVP as soon as possible if you plan to attend as the event may be postponed / cancelled if lacking interest.
Good Afternoon,
We will be hosting Kurt J. Lesker Company on February 15th from 10:00AM – 2:30PM and February 16th from 9:00AM – 1:00PM.
They will be teaching 3 classes from their Lesker University Vacuum Technology program. The event is free to all participants and food will also be provided. For more details including exact topics covered please see the attached .pdf program.
Schedule:
Thursday Feb 15th 10:00AM- 2:30PM – Class 1: Introduction to Vacuum Science and System Design
Friday Feb 16th 9:00AM-1:00PM – Class 2: Physical Vapor Deposition and Thin Film Growth Models and Class 4: Introduction to Vacuum System Design
Please RSVP as soon as possible to Marc Palazzo at
mdpalazz@uci.edu . Event locations are TBD.
-Staff
Good Afternoon,
We will be hosting Kurt J. Lesker Company on February 15th from 10:00AM – 2:30PM and February 16th from 9:00AM – 1:00PM.
They will be teaching 3 classes from their Lesker University Vacuum Technology program. The event is free to all participants and food will also be provided. For more details including exact topics covered please see the attached .pdf program.
Schedule:
Thursday Feb 15th 10:00AM- 2:30PM – Class 1: Introduction to Vacuum Science and System Design
Friday Feb 16th 9:00AM-1:00PM – Class 2: Physical Vapor Deposition and Thin Film Growth Models and Class 4: Introduction to Vacuum System Design
Please RSVP as soon as possible to Marc Palazzo at
mdpalazz@uci.edu . Event locations are TBD.
-Staff
Notice:
The MA56 in the BiON has been repaired and is Online. The MA6 in the INRF has also been repaired and is Online.
NO SU-8 is allowed on the MA6 in the INRF. SU-8 processes must be done on the MA56 in the BiON.
-Staff
INRF and BiON Users,
Staff is noticing that users are failing to follow proper protocol and so due to safety concerns the doors to access the lab equipment chases will be kept locked for the time being. Please be sure to schedule with Staff when you need something turned on or off, opened or closed, or have a need to access.
Thank You,
Staff
Reminder:
Users that are using various types of tools are responsible for performing the cleaning process.
When it comes to the RIE, ICP, DRIE the rule of thumb is two to one. So if etching for one hour we expect you to do a thirty minute clean. If etching for 90min, the clean recipe should be run for 45min. Etc.
Please be sure you are following this policy.
Thank You,
Staff
INRF & BiON Users,
If you do plan to use either the BiON or the INRF during the holiday break ( Dec 23 2017 – Jan 2 2018 ) please contact staff to let them know your plans.
Please also remember to log IN as well as OUT of the facility on Forged as well.
Thank You,
Staff
INRF Users,
The DI Water in the INRF has been restored and is back Online.
Facilities Management discovered that a pump in the system failed badly. We have a backup pump and so that one was turned on getting us back into full operation.
Forged has been updated accordingly.
Staff
INRF Users,
It’s come to our attention that the DI Water is not working in some rooms of the INRF but is working in at least one room. We’ve received no notice about this and are currently investigating as to what may have happened. Facilities Management has already been notified as well so hopefully we’ll see this issue resolved ASAP.
Forged has been updated accordingly.
Staff
