Integrated Nanosystems Research Facility


Users that are using various types of tools are responsible for performing the cleaning process.

When it comes to the RIE, ICP, DRIE the rule of thumb is two to one.  So if etching for one hour we expect you to do a thirty minute clean. If etching for 90min, the clean recipe should be run for 45min. Etc.

Please be sure you are following this policy.

Thank You,