Integrated Nanosystems Research Facility

INRF & BiON Users,

Due to a potential increase chance of risk to campus personnel, for the time being please do not leave wet chemical processes unattended on the lab benches after-hours.
This includes but is not limited to HF processes, piranha etch solutions and RCA cleans solutions.
Repeat: No wet chemical processes are to be left unattended after-hours.
Please be sure to plan appropriately and complete your work including finishing cleaning up by end of business day each day.
Thank You,
INRF Staff