Integrated Nanosystems Research Facility

INRF & BiON Users,
Contamination is becoming an issue on various tools across the labs.   Two in particular very recently have been the STS and the Plasmatherm. Please be sure to review and abide by the policies aligned for the particular tool you are using.   It seems some materials inside chambers are re-depositing onto other’s substrates negatively affecting results. With respect to the etchers, be sure the proper cleaning procedure is performed as well as recorded in the log book as its own entry.
Going forward if users complain about contamination issues and this results in the need for staff and tool time to be spent  performing additional O2 cleans and manual chamber cleans, the last user that didn’t record or perform the required O2 cleans will be billed accordingly.
Thank You,
INRF Staff