Integrated Nanosystems Research Facility

First Nano Furnace (EasyTube 3000 System)

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First Nano EasyTube 3000 system is the most advanced customizable chemical vapor deposition/annealing process tool for nanomaterials synthesis, thin film depositions and anneals. EasyTube®3000 is capable of synthesizing a myriad of nanostructures and thin film including single-walled or multi-walled nanotubes, Graphene, nanowires such as Si, Ge, ZnO, GaN, BN, and thin film such as Si, SiO2 and Si3N4 using selected combinations of hydrides, liquids and/or solid precursors. The system can also be customized for Annealing, Selenization and/or Sulfurization applications.

The EasyTube® systems are now being used for process development and/or materials growth across many industries including nanoelectronics, semiconductor, photovoltaic, NEMS/MEMS, composite, structural coatings, etc.


  • CVDWinPrC™ based process control software for Real Time Process Control, Data Logging and Display, Recipe Generation and Editing
  • Preprogrammed Recipes for a wide variety of applications
  • 3 Zone Resistance Furnace for Temperatures up to 1100 °C
  • Multi-zone Furnace with Proprietary Real-Time Cascade Process Temperature Control
  • Low Pressure Operation (100 – 700 torr), < 50 mtorr Base Pressure
  • Wafer Sizes up to 100mm
  • High Throughput with FastCool™ Furnace
  • Proprietary Real-Time Cascade Process Temperature Control
  • Cantilevered Automatic Substrate Loading/Unloading System
  • 5″ Quartz Reaction Chamber
  • 4 Mass Flow Controlled UHP Gas Lines
  • User Settable Warnings and Alarms
  • Application Customized Safety Systems
  • Comprehensive Software and Hardware Safety Interlocks