Integrated Nanosystems Research Facility

INRF & BiON Users,

In order to ensure safety to all persons, equipment, and research samples it is important for everyone to ensure the Forged system is accurate with the log ins of the facility, wet process benches, and tools.
Please continue to be diligent about having Forged reflect accurately when you are in and out of the lab (BiON & INRF), as well as accurate to when you are using equipment and using those wet processing benches that require it as well.
Management has decided that going forward, failure to do so will result in a penalty fee of three times (3x) the cost of standard use.
Reminder: For etchers, users must remain signed into the tool when running the required post-process chamber O2 cleans