Integrated Nanosystems Research Facility

Good morning everyone,
Here is an update on the exhaust issue for the Laminar Flow chemical benches.

I met with facilities today and we went up above the ceiling to look at the ventilation exhaust system so they can get a better understanding of what needs to be done.
They are planning on getting an engineering firm under contract to evaluate our system. I also had a discussion with EH&S today. I am providing them with the mfg. and some information on our existing Laminar flow chemical wet benches. EH&S will then arrange a meeting with TSS this week to consult with them to resolve the exhaust issue.

Until further notice EH&S advises we do not do any processing on our benches in the INRF. In the meantime we can perform various preapproved processes on our benches within the BION facility.

No HF processes should be performed in the chemical wet etch bench in the BION until further notice.