Integrated Nanosystems Research Facility

New INRF Tools

The following tools are now available in the INRF Cleanroom.

CHA Mack 50 EvaporationCHA Mark 50 Evaporation
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CHA Mark 50 Systems have become the industry standard for high vacuum deposition systems. Simplicity in design, ease of operation and unmatched reliability make the Mark 50 an excellent choice for a wide range of applications, from computer control to manual operation, from production runs to nano-scale R&D research. The Mark 50′s horizontal 32″ by 32″ water-cooled cylindrical chamber simplifies loading and unloading.

For training and additional information, contact Mo Kebaili.

First Nano Furnace (EasyTube 3000 System)First Nano Furnace (EasyTube 3000 System)
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This tool is the most advanced customizable chemical vapor deposition/annealing process tool for nanomaterials synthesis, thin film depositions and anneals. EasyTube®3000 is capable of synthesizing a myriad of nanostructures and thin film including single-walled or multi-walled nanotubes, Graphene, nanowires such as Si, Ge, ZnO, GaN, BN, and thin film such as Si, SiO2 and Si3N4 using selected combinations of hydrides, liquids and/or solid precursors. The system can also be customized for Annealing, Selenization and/or Sulfurization applications.

For training and additional information, contact Jake Hes.

Atomic Layer Deposition SystemAtomic Layer Deposition System
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This tool is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than 2000:1. This system is equipped with heated precursors lines and the option to add up to six precursor lines.

For training and additional information, contact Mo Kebaili.