Integrated Nanosystems Research Facility

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Work Description
  • Deposition

  • Characterization

  • Dry Etching

  • Packaging

  • Electroplating
  • Lithography
  • Wet Etching
  • Hot Embossing
  • Process Development / Staff Support


Substrates Information
Type: Size: Thickness: Quantity:

Description (be as detailed as possible for process development):

*For Lithography work, please email your mask design to: info@inrf.uci.edu


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