Integrated Nanosystems Research Facility
Solitec Spinner Model 5110-C-TD
- Photoresist developing (positive) Substrate size up to 4”
- Photoresist developing (negative) Substrate size up to 4”
Accelaration:
Variable from 1.00 to 40.000 RPM/SEC
- Wafer Handling (Manual loading)
Solitec Automatic Coating Single Chuck Coater/ Small Cartridge Dispenser
- Wafer handling (manual loading)
- Solvent dispense (Pressure tank)
- Substrate size (max 9” round) 7” square
- Acceleration variable from 1.000 to 40.000 RPM/Sec
