Integrated Nanosystems Research Facility

Solitec Spinner Model 5110-C-TD

icon-view-photos View Photo Gallery

  • Photoresist developing (positive) Substrate size up to 4”
  • Photoresist developing (negative) Substrate size up to 4”

Accelaration:
Variable from 1.00 to 40.000 RPM/SEC

  • Wafer Handling (Manual loading)

Solitec Automatic Coating Single Chuck Coater/ Small Cartridge Dispenser

  • Wafer handling (manual loading)
  • Solvent dispense (Pressure tank)
  • Substrate size (max 9” round) 7” square
  • Acceleration variable from 1.000 to 40.000 RPM/Sec