Integrated Nanosystems Research Facility

Karl Suss MJB-3 Mask Aligner

Karl Suss MJB-3 Mask Alignericon-view-photos View Photo Gallery
The Karl Suss MJB-3 Mask Aligner is designed for high resolution photolithography. This tool offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3″ in diameter.

  • Substrate size up to 3”
  • Exposure wave lengths 300 – 500 nm (365 – 405 nm)
  • Line/space resolution 2.5 microns
  • Aligner performs in hard contact/soft contact mode