Integrated Nanosystems Research Facility

Heatpulse 610 RTA

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Heatpulse 610 RTA is a desktop rapid thermal processor for 2 to 6 inch wafer, which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber’s cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing systems.