Integrated Nanosystems Research Facility

PE 2400 Sputtering

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A sputtering system with an RF generator. It has a manual load system, and 6 table positions.

  • RF etch
  • DC and RF deposition stations
  • PE 2KW RF power supply
  • AE MDX DC P/S
  • Digital clock timer
  • PE digital gauge controller
  • PE pump (valving) controller
  • PE match controller
  • CTI Cryo regen controller
  • CTI 8" Cryo pump with compressor
  • Alcatel 2063 roughing pump.