March 30 | Issue 8
We present this month a member of the INRF research community, Rahim Esfandyarpour. Esfandyarpour received his Ph.D. and M.Sc. in Electrical Engineering from Stanford University. He is currently an assistant professor of electrical engineering & computer sciences and biomedical engineering. His interdisciplinary research group focuses on applying innovative engineering concepts to address major challenges in modern life science and medicine. They design, model, micro/nanofabricate, and validate innovative, state-of-the-art, novel -omics, and multi-level Next-Generation Smart (NGS) Wearable & Portable NanoBioElectronic devices to truly mimic an individual’s overall dynamic health. Toward this goal, his group aims to integrate innovative micro/nanoelectronics and functional nanomaterials using novel next-generation manufacturing technologies, supported by intelligent computing techniques (e.g., ML), along with smart electronic system designs. In his lab, students combine expertise in micro/nanoelectronics, flexible and wearable electronics, micro/nanofabrication, micro/nanotechnology, micro/nanoelectromechanical (N/MEMS) systems, micro/nanofluidics, nanomaterials, 3D-bioprinting, and microelectronic circuits and systems design.
Karl Suss MA6 Mask Aligner
Karl Suss MA6 is a double-sided contact mask aligner and can be used to perform high-resolution photolithography. The tool is a mask alignment and exposure system that works for 4″ wafers and 5″ masks with positive photoresist lithography. Smaller wafers and chips may be mounted to a 4″ carrier wafer and processed.