Dear prospective INRF user,
Welcome to the Integrated Nanosystems Research Facility (INRF). The INRF was set up to facilitate research in micro- and nano-systems technology. It is an 8600 sq. ft., class 1,000/10,000 clean room facility, with class 100 work areas and with all major semiconductor fabrication equipment. As a research facility, most of the equipment is made available to all users, with flexible usage policies. This makes the INRF a unique facility, and a wonderful resource for academic and industrial scientists.
INRF users enjoy the following privileges:
- Training for use of the INRF clean room facility
- Training and certification for use of any "public general use" equipment
- Unsupervised use of any "public general use" equipment for which the user
is certified
- Use of standard chemicals and INRF materials
New users need to complete the following before they can enter the clean
room facility without an escort:
Note: The forms below were created to fill out online using Adobe
PDF 5.0 or later.
Once these have been completed, users can expect to receive the following:
- One electronic key (per user)
- INRF User Safety Training Manual
- Clean room garments (for use in the clean room only)
- A box to carry/store samples.
In addition, you should be aware and familiar with the following documents
which are accessible to you:
As in most research facilities, some of the INRF equipment have hazards associated
with them. These hazards can be minimized through proper user training, and
sensible usage policies. We require all new users to take two types of training:
(1) INRF user safety training, and (2) equipment specific training (for each
piece of equipment). Through these training sessions, you will learn the policies
concerning the safe and proper use of the facility. If you have any concerns
regarding safety at any time, do not hesitate to contact INRF staff.
Our goal is to help all users use the facility properly and safely, minimizing
the risks and wastes associated with the facility. We hope the facility meets
your research needs, and look forward to your success. Sincerely,
G. P. Li
INRF Director