Integrated Nanosystems Research Facility

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Diffusion Furnaces

6 Inch Dry and Wet Oxidation Tube (Staff Tool)

4 Inch Dry Oxidation Tube

4 Inch Long Anneal Tube

4 Inch Sintering Tube

4 Inch Boron Tube (staff tool)

2 Inch Nano furnace Tube (staff tool)

4 Inch Min-Brute Tube
Furnace used for bonding substrate.

Heatpulse 610 RTA
Heatpulse 610 RTA is a desktop rapid thermal processor for 2 to 6 inch wafer, which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures.

Anodic Bonding Furnace up to 4 Inch (Staff Tool)